Overview and details of the sessions of this conference. Please select a date or location to show only sessions at that day or location. Please select a single session for detailed view (with abstracts and downloads if available).
10:30 - 10:50 Invited ID: 164 / MOS 2: 1 Manufacturing, Tolerancing, and Testing of Optical Systems (MOS)
Pushing Precision Manufacturing to the Limits: optics for EUV litography
Carl Zeiss SMT GmbH, Germany
Back in 1995 ZEISS began its EUV optics development program to enable EUV lithography @13.5nm. In 2019 semiconductor manufacturer will start high volume manufacturing of chips using an ASML EUV Step-and-Scan system with optics from ZEISS. This important milestone was achieved by pushing the limits of optics precision manufacturing from nm to pm range over the last two decades. The presentation gives some top level insights in the state of the art EUV optics manufacturing @ ZEISS.
10:50 - 11:05 ID: 162 / MOS 2: 2 Manufacturing, Tolerancing, and Testing of Optical Systems (MOS)
Efficient Robust Design Optimization Of Optical Systems
To accelerate the virtual product development of using optical simulation software, the Robust Design Optimization approach is very promising. Optical designs can be explored thoroughly by means of sensitivity analysis. This includes the identification of relevant input parameters and the modelling of inputs vs. outputs to understand their dependencies and interactions.
Furthermore, the intelligent definition of objective functions for an efficient subsequent optimization is of high importance for multi-objective optimization tasks.To find the best trade-off between two or more merit functions, a Pareto optimization is the best choice. As a result, not only one design, but a front of best designs is obtained and the most appropriate design can be selected by the decision maker.
Additionally, the best trade-off between output variation of the robustness (tolerance) analysis and optimization targets can be found to secure the manufacturability of the optical design by several advanced approaches. The benefit of this robust design optimization approach will be demonstrated.
11:05 - 11:20 ID: 156 / MOS 2: 3 Manufacturing, Tolerancing, and Testing of Optical Systems (MOS)
Multifunctional Contamination-Resistant Coatings
Nadja Felde, Anne Gärtner, Stefan Schwinde, Sven Schröder
Fraunhofer IOF, Germany
Surface contaminations can critically affect the performance of optical surfaces, in particular with respect to light scattering, optical losses, and laser stability. Thus, avoiding contaminations and reducing contamination-induced effects is of particular interest in the manufacturing of optical systems. By combining a specific thin film design with a tailored structural design, contamination-resistant coatings with a high optical quality can be realized. Most important is the balance of self-cleaning- and light scattering-relevant surface roughness components.
11:20 - 11:35 ID: 169 / MOS 2: 4 Manufacturing, Tolerancing, and Testing of Optical Systems (MOS)
Multilevel Axicon For Perfect Optical Vortex Generation
Rebeca Tudor, Mihai Kusko, Cristian Kusko, Andrei Avram
National Institute for Research and Development in Microelectronics - IMT Bucharest, Romania
We present the fabrication of a beam shaper with 32 levels for the generation of nondiffractive optical fields representing quasi-Bessel beams of order zero. This optical element is designed for visible light (λ=633 nm) and fabricated using standard photolithography and a fine calibrated reactive ion etching process. A large number of levels approximates a continuous conical surface so that the optical quality of the element is very good. It is investigated the possibility of generating perfect optical vortices with this class of optical elements.
11:35 - 11:50 ID: 171 / MOS 2: 5 Manufacturing, Tolerancing, and Testing of Optical Systems (MOS)
Towards Accessible Nanophotonics: Multimode Interferometer on Strip-loaded Slot Waveguide
Matthieu Roussey, Ratish Rao, Ségolène Pélisset
University of Eastern Finland, Finland
Nano- and micro-photonics are the key-enabling tools for future integrated components and circuitry operating at low power and high speed. By using a strip-loaded platform, we show how we can dramatically reduce the complexity, in terms of fabrication and tolerances, of the most advanced devices. Different configurations of multimode interference devices are presented. We show the design, fabrication, and optical characterization of these components.