Conference Agenda

Overview and details of the sessions of this conference. Please select a date or location to show only sessions at that day or location. Please select a single session for detailed view (with abstracts and downloads if available).

Session Overview
Joint Session: EOS MOS and SPIE OM: Measurement of Optical Components I: Asphere and Freeform Measurement
Wednesday, 26/Jun/2019:
16:00 - 18:00

Session Chair: Sven Schröder, Fraunhofer IOF, Germany
Location: Room 14 c
ICM, 1st floor

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16:00 - 16:20
ID: 115 / Joint Session: 1
Manufacturing, Tolerancing, and Testing of Optical Systems (MOS)

Approaches For A Destructive Measurement Method Of Subsurface Damages

Michael Seiler1, Lukas Tianis1, Jens Bliedtner1, Mario Berlinger2, Steffen Gürtler2

1Ernst-Abbe-Hochschule Jena, Germany; 2Bühler Alzenau GmbH Standort Leipzig, Germany

In optical manufacturing, the depth of subsurface damages (SSD) depicts an important quality aspect of optical elements. Nowadays, the investigation methods of the damage zone are mostly destructive and allow a sampling of the substrates only. This leads to a lack of statistical reliability. In this paper, one aim is to develop an easy and cheap procedure to evaluate the probes. Therefore, a spherical polishing and chemical etching is introduced. By means of imaging processing software the acquired data is analyzed, which eliminates the operator influence und increases the reproducibility. Applying binarizing and shape detection algorithms the SSD structures is detected and the number of pixels per structure is calculated. The percentage of SSD over the depth fit with an exponential curve displays a maximum depth as a single value. . The development of a method to choose the best threshold value represents an approach to quantify the uncertainty of the resulting SSD-depth.

16:20 - 16:40
ID: 177 / Joint Session: 2
Manufacturing, Tolerancing, and Testing of Optical Systems (MOS)

Grazing Incidence Interferometry For Testing Rough Aspherics

Sergej Rothau

Friedrich-Alexander-University, Germany

Grazing incidence interferometry for testing rough aspherics

Original submission ID: 11056-50

Co-authors: Klaus Mantel, Max-Planck-Institut für die Physik des Lichts (Germany); Johannes Schwider, Norbert Lindlein, Friedrich-Alexander-Univ. Erlangen-Nürnberg (Germany)

16:40 - 17:00
ID: 151 / Joint Session: 3
Manufacturing, Tolerancing, and Testing of Optical Systems (MOS)

Measurement And Correction Of Two-sided Freeform Optical Elements With Combined Tactile-optical Metrology Equipment

Johannes Hartung1, Henrik von Lukowicz1,2, Mathias Rohde1, Knut Kleinbauer1, Nils Heidler1, Stefan Risse1

1Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany; 2Institute of Applied Physics, Friedrich-Schiller-University, Jena, Germany

Freeform optical elements are state of the art for several years to fabricate very high performance optical systems with the necessity of, e.g., strong folding in mirror system or correction of typical asymmetric aberrations in mirror systems as well as lens systems. For freeform mirror systems, in particular for metal mirrors, the metrology is well understood and iterative process chains are well established. For transmission elements with a freeform surface on both sides, manufacturing, metrology, and correction for both sides in a parallel manner is quite difficult. The article presents a method to measure such an optical element and correct it with a well-defined correction step to have both sides in a well-defined position to each other.

17:00 - 17:20
ID: 178 / Joint Session: 4
Manufacturing, Tolerancing, and Testing of Optical Systems (MOS)

Tilted Wave Interferometer In Common Path Configuration: Challenges And Realization

Rolf Beisswanger

Institut für Technische Optik, Univ. Stuttgart, Germany

Tilted wave interferometer in common path configuration: challenges and realization

Original submission ID: 11056-51

Co-authors:Christof Pruss, Institut für Technische Optik, Univ. Stuttgart (Germany); Christian Schober, TU Dresden (Germany); Antonia Harsch, Wolfgang Osten, Institut für Technische Optik, Univ. Stuttgart (Germany)

17:20 - 17:40
ID: 127 / Joint Session: 5
Manufacturing, Tolerancing, and Testing of Optical Systems (MOS)

Investigation of Non-Uniformity of Classically-Polished Fused Silica Surfaces via Laser-Induced Breakdown Spectroscopy

Christoph Gerhard1, Jörg Hermann2

1University of Applied Sciences and Arts, Germany; 2Aix-Marseille University, CNRS, LP3, France

In this contribution, the surface uniformity of classically-manufactured fused silica windows was investigated via laser-induced breakdown spectroscopy. It is shown that for all investigated samples a comparatively high aluminium content was found at the edge of the surface with respect to its centre. This contamination can be attributed to residues from lapping and polishing agents and leads to a mentionable non-uniformity of the surface in terms of chemical composition and optical properties, respectively.

17:40 - 18:00
ID: 179 / Joint Session: 6
Manufacturing, Tolerancing, and Testing of Optical Systems (MOS)

Measurement Of Mid-Spatial Frequency Errors On Freeform Optics Using Deflectometry

Todd F. Blalock

Optimax Systems, Inc., United States of America

Measurement of mid-spatial frequency errors on freeform optics using deflectometry

Original submission ID: 11056-52

Co-authors: Brittany D. Cox, Brian Myer, Optimax Systems, Inc. (United States)

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