Conference Agenda

Overview and details of the sessions of this conference. Please select a date or location to show only sessions at that day or location. Please select a single session for detailed view (with abstracts and downloads if available).

 
Session Overview
Session
MOS 10: Manufacturing of Optical Systems: Joint Session with SPIE 2: High-Precision Measurement of Optical Components and Systems
Time:
Wednesday, 28/06/2017:
16:00 - 18:10

Session Chair: Marcus Trost, Fraunhofer IOF
Location: Room 21, 2nd floor, ICM
MOS

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Presentations
16:00 - 16:30
Invited

Dynamic interferometry: metrology of space optics and structures

James E. Millerd

4D Technology Corp.

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16:30 - 16:50

In situ laser polishing optimization method: Control of LASer Surface Optimisation (C-Lasso)

Rolf Rascher1, Christian Vogt1, Oliver Fähnle2

1Technische Hochschule Deggendorf, Germany; 2Fisba AG, Switzerland

Laser polishing is achieved by local absorption of laser power within the polishing spot causing the surface and its sub-surface region to melt and flow reducing surface roughness and removing sub-surface damage. In this paper we present a novel fabrication controlling method for laser polishing processes called C-Lasso (Control of LASer Surface Optimization, Patent Pending), monitoring in situ the surface smoothening process. It is possible to determine and control the minimum dwell time a footprint needs to stay at a certain point before moving further. C-Lasso enables to avoid unnecessarily long local dwell times. Besides the functioning principle, a proof of concept will be presented as well as experimental data demonstrating the in situ monitoring.


16:50 - 17:10

Preliminary results of a new proposal for objective human independent striae measurement

Steffen Reichel

Pforzheim University, Germany

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17:10 - 17:30

Wavefront evaluation method based on imaging performance: relative wavefront gradient deviation

Bin Xuan, Jing-jiang Xie

Changchun Institute of Optics, Fine Mechanics and Physics (CIOMP), China, People's Republic of

A wavefront evaluation method based on imaging performance is proposed. When wavefront gradient is normalized by Airy disk and evaluated on the basis of image energy center, relative wavefront gradient deviation is deduced. It is independent on aperture size and can be used to evaluate imaging performance precisely.


17:30 - 17:50

Development of wavefront sensor for in-situ measurement of freeform optics

Dali R. Burada

Indian Institute of Technology Delhi, India

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17:50 - 18:10

Metrology for Freeform and Wafer level optics by UA3P

Dieter Ramm, Tomofumi Morishita, Keishi Kubo

Panasonic Automotive & Industrial Systems Europe GmbH, Germany

Recently the demand of the metrology for large asphere and freeform are increasing for mobile phone and other area. We have developed new technology having the accuracy is less 0.1um and scanning speed is 30mm/s. And we have developed special unit and function for this machine to measure 4,000 lens on the single wafer.



 
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