Conference Agenda

Overview and details of the sessions of this conference. Please select a date or location to show only sessions at that day or location. Please select a single session for detailed view (with abstracts and downloads if available).

 
Session Overview
Session
MOS5: Manufacturing of Optical Systems: EUV and X-Ray
Time:
Tuesday, 27/06/2017:
10:30 - 12:00

Session Chair: Sven Schröder, Fraunhofer Institute IOF
Location: Room 21, 2nd floor, ICM
MOS

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Presentations
10:30 - 10:45
Invited

Manufacturing and Industrialization of EUV Lithography Optics

Martin Lowisch

Zeiss SMT, Germany

tba


10:45 - 11:00
Invited

EUV-Komponenten und Systeme

Torsten Feigl

optiX fab GmbH, Germany

-


11:00 - 11:15

Characterization of EUV optical components

Marcus Trost1, Matthias Hauptvogel1, Sven Schröder1, Robert Jende1, Ralf Steinkopf1, Stefan Risse1, Marco Perske2, Hagen Pauer2, Tobias Fiedler2, Torsten Feigl2

1Fraunhofer IOF, Germany; 2optiX fab GmbH, Germany

Optical components for the extreme ultraviolet (EUV) face stringent requirements for surface finish, because even lowest levels of residual imperfections can cause significant optical losses and impair image quality. Approaches to characterize these irregularities over extended areas by light scattering measurements will be discussed in this contribution.


11:15 - 11:30

The Development of Extreme Ultraviolet / Soft X-Ray Optical System at SKLAO

Chun-shui Jin, Li-ping Wang, Yao Xie, Bo Yu, Hui Wang, Jie Yu, Hai-tao Zhang, Yu Liu, Feng Zhou, Benyin Guo, Wei Huang

State Key Laboratory of Applied Optics(SKLAO), Changchun Institute of Optics, Fine Mechanics and Physics(CIOMP), Chinese Academy of Sciences(CAS)

An overview of recent development of the extreme ultraviolet (EUV)/soft X-ray optical system at SKLAO was presented. The testing and fabrication of aspheric mirrors, EUV/soft X-ray multilayer films, semi-kinematic mount, six-DOF precise adjustment platform, optical system alignment based on our homemade point diffraction interferometer (PDI) are discussed.


11:30 - 11:45

Two-color prime laser of subnanosecond pulses for EUV lithography

Aleksandr Zhevlakov1, Viktor Bespalov2, Ruben Seisyan3

1Vavilov State Optical Institute, Russian Federation; 2ITMO University, Russian Federation; 3Ioffe Physical-Technical Institute RAS, Russian Federation

Raman frequency conversion 30ps-pulses of Nd:YAG laser for amplification in three rotational transitions of CO2 molecules was studied. The effective SRS conversion in compressed hydrogen from range of 1.90....1.96 µm to 9.1....10.6 mkm is provided under narrow linewidth pumping of 0.1 cm-1 and beam divergence not worse ~0.2 mrad . Experimentally established that the addition of the rare gases in SRS medium allows to increase the output energy and to improve the parameters of the Stokes output beam at wavelength of 9.1...10.6 mkm. The use SRS convertors in powerfull CO2 laser decreases power consumption in primary source of EUV lithography.


11:45 - 12:00

Development of iridium coated silicon X-ray mirrors for Lobster Eye astronomical telescopes

Veronika Stehlikova1,2, Anne-Catherine Probst3, Ondrej Nentvich1, Martin Urban1, Adolf Inneman1,4, Ladislav Sieger1, Veronika Marsikova1,4, Thorsten Döhring3

1Czech Technical University in Prague, CZ-16636 Prague, Czech Republic; 2Max Planck Institute for Extraterrestrial Physik, Germany; 3Aschaffenburg University of Applied Sciences, D-63743 Aschaffenburg, Germany; 4Rigaku Innovative Technologies Europe, CZ-14221 Prague, Czech Republic

In the field of X-ray astronomy different types of telescope optics based on grazing incidence mirrors can be used. This contribution presents a special design of a Lobster Eye wide-field telescope with mirrors based on flat silicon wafers and the task of coating such mirror substrates with reflective iridium layers.



 
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