Conference Agenda

2:00pm - 2:20pm

Relation between subsurface formation mechanism and ablation efficiency during femtosecond laser processing of polycrystalline alumina

Akito Ueda¹, Ryo Koike¹, Yasuhiro Kakinuma¹, Hideki Aoyama¹, Yusuke Ogiso², Makoto Inoue²

¹Keio University, Japan; ²NGK Insulators, Ltd., Japan

2:20pm - 2:40pm

Study of bottom-up column formation in bulk silicon initiated at silicon-air and silicon-glass interfaces by ultrafast laser processing

Akhil Kuriakose¹, Maxime Fenech¹, Manon Lafargue^1,2, Théo Guilberteau^1,3, Markus Blothe⁴, Maxime Chambonneau⁴, John Lopez¹, Michael Jarwitz¹, Stefan Nolte^4,5, Inka Manek-Hönninger¹

¹Université de Bordeaux-CNRS-CEA, CELIA UMR 5107, 33405 Talence, France; ²AMPLITUDE, Cité de la Photonique, 33600 Pessac, France; ³ALPhANOV, Rue François Mitterrand, 33400 Talence, France; ⁴Friedrich Schiller University Jena, Abbe Center of Photonics, Institute of Applied Physics, Albert-Einstein-Straße 15, Jena 07745, Germany; ⁵Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Center of Excellence in Photonics, Albert-Einstein-Straße 7, Jena 07745, Germany

2:40pm - 3:00pm

Laser removal of residual layers generated by atmospheric plasma jet etching of optical glass

Martin Ehrhardt, Robert Heinke, Pierre Lorenz, Thomas Arnold, Klaus Zimmer

Leibniz-Institut für Oberflächenmodifizierung (IOM), Germany

3:00pm - 3:20pm

Advancing Process Stability for Next‑Generation Ultrafast Laser Micromachining (Industrial Talk)

Daniel Schwab

GFH GmbH, Germany