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TOM Materials S4: Optical Materials: Optical materials
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4:30pm - 5:00pm
INVITED ID: 298 / TOM Materials S4: 1 Optical Materials Engineering Terahertz–UV Emitters: Black Surfaces 1UEF University of Eastern Finland (22951), Finland; 2Center for Physical Sciences and Technology (FTMC), Vilnius 10257, Lithuania; 3LUT School of Engineering Sciences, Lappeenranta 53850, Finland; 4The University of Tokyo, Tokyo 113-0033, Japan Ultrabroadband absorbers spanning the terahertz (THz) to deep-ultraviolet (DUV) range are key for advanced photonic applications. This talk compares three material platforms: silicon moth-eye structures covered with nm-thin pyrolytic carbon (PyC) film, black nickel coatings, and black titanium dioxide. While moth-eye/PyC systems achieve near-unity absorption with complex nanostructuring, black nickel offers a scalable and cost-effective alternative with slightly lower performance. Black titania provides a chemically stable, semiconductor-based approach with tunable properties, though with reduced absorption efficiency. The comparison highlights trade-offs between performance, scalability, and functionality for practical applications. 5:00pm - 5:15pm
ID: 327 / TOM Materials S4: 2 Optical Materials Wavelet-based picosecond ultrasonics for buried interface characterisation in optical thin films Institute of Plasma Physics of the Czech Academy of Science, Czech Republic (Czechia) Interferometric thin films are central to photonic and optoelectronic applications, where device performance is critically determined by material properties and the quality of buried interfaces. Characterising such interfaces at the nm scale remains challenging. Here we apply picosecond ultrasonic spectroscopy — a non-destructive pump-probe technique — to study the internal structure of thin film stacks. Brillouin oscillations in the transient reflectivity signal encode the local refractive index and acoustic velocity as a function of depth, and wavelet transform analysis enables their depth-resolved extraction. We demonstrate the approach on chemically etched NSF10 glass, identifying a gradient refractive index layer at the surface. The results confirm that wavelet-based ps ultrasonics is an effective tool for non-destructive interface metrology in optical thin films. 5:15pm - 5:30pm
ID: 321 / TOM Materials S4: 3 Optical Materials Crystal Field Tensor Operators for Rare-Earth Ions Leibniz University Hannover, Germany Rare-earth ions are essential for laser applications due to their distinct spectral characteristics. However, modeling the Stark splitting in crystalline media remains challenging due to the limited accessibility of high-quality matrix elements. This situation has been addressed by the recent AMELI repository, which provides all required matrix elements calculated in exact arithmetic. This work adds convenient crystal field operators to the repository. | ||
