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Session Overview
Session
TOM5 S03: Optical materials, synthesis characterization and applications
Time:
Tuesday, 12/Sept/2023:
3:30pm - 5:00pm

Session Chair: Akira Satou, Tohoku University, Japan
Location: Meursault/ Nuit ST-G./Corton


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Presentations
3:30pm - 4:00pm
Invited
ID: 349 / TOM5 S03: 1
TOM 5 Optical Materials

Polarization-anisotropy of mid-infrared emission properties of Er3+ ions in YAlO3 crystal

Ahmed Nady1, Florent Cassouret2, Pavel Loiko1, Simone Normani1, Alain Braud1, Weidong Chen3, Valentin Petrov3, Dunlu Sun4, Peixiong Zhang5, Bruno Viana2, Ammar Hideur6, Patrice Camy1

1Centre de Recherche sur les Ions, les Matériaux et la Photonique (CIMAP), UMR 6252 CEA-CNRS-ENSICAEN, Université de Caen Normandie, 6 Boulevard Maréchal Juin, 14050 Caen, France; 2Chimie ParisTech, PSL University, CNRS, Institut de Recherche de Chimie Paris, 11 rue Pierre et Marie Curie, 75005 Paris, France; 3Max Born Institute for Nonlinear Optics and Short Pulse Spectroscopy, Max-Born-Str. 2a, 12489 Berlin, Germany; 4Anhui Institute of Optics and Fine Mechanics, Hefei Institutes of Physical Science, Chinese Academy of Sciences, 230031 Hefei, China; 5Department of Optoelectronic Engineering, Jinan University, 510632 Guangzhou, China; 6CORIA UMR6614, CNRS-INSA-Université de Rouen Normandie, Normandie Université, 76801 Saint Etienne du Rouvray, France

We report on a polarization-resolved study of mid-infrared emission properties of Er3+ ions in the orthorhombic YAlO3 crystal. For the 4I11/2 → 4I13/2 transition, σSE reaches 0.20×10-20 cm2 at 2919 nm (for light polarization E || c). Pump-induced polarization switching between the E || b and E || c eigen-states is observed in an 10 at.% Er:YAlO3 laser. Pumped by an Yb-fiber laser at 976 nm, this laser delivers 0.77 W at 2919 nm with a slope efficiency of 31.4% being close to the Stokes limit and a laser threshold of 33 mW.



4:00pm - 4:15pm
ID: 136 / TOM5 S03: 2
TOM 5 Optical Materials

Analysis of the recording of Fibonacci lenses using photopolymers with 3-D diffusion model

Juan Carlos Bravo Francés1,2, Joan Josep Sirvent Verdú1,2, José Carlos García Vázquez1,3, Andrés Pérez Bernabeu1,2, Jaume Colomina Martínez1,2, Roberto Fernández Fernández1,2, Andrés Márquez Ruiz1,2, Sergi Gallego Rico1,2

1Instituto Universitario de Física Aplicada a las Ciencias y las Tecnologías, Universidad de Alicante, Apartado 99, E03080 Alicante, Spain; 2Departamento de Física, Ingeniería de Sistemas y Teoría de la Señal. Universidad de Alicante, Apartado 99, E03080 Alicante, Spain; 3Departamento de Óptica, Farmacología y Anatomía. Universidad de Alicante. Apartado 99, E03080 Alicante, Spain

In the present work, a 3-Dimensional diffusion model is proposed to predict the main properties of Diffractive Optical Elements (DOEs), recorded in photopolymers, including refractive index modulation and the evolution of the transverse intensity distribution. The model enables the selection of appropriate material characteristics based on the intended application of the DOE. Specifically, a PVA/AA photopolymer based on acrylamide is simulated using the proposed model, considering coverplating and index matching systems to mitigate the effects of thickness variation. In order to compare its properties using the suggested model, the simulation focuses on a Fibonacci Lens and the dependece of the intensity by the polymerization rate. Accordingly, axial intensity pattern is represented to prove the bifocal-behaviour of these diffractive lenses.



4:15pm - 4:30pm
ID: 363 / TOM5 S03: 3
TOM 5 Optical Materials

Towards freeform manufacturing of ultra-low expansion glass optics

Samuel Youcef Benketaf

Galatea Laboratory, Switzerland

Ultra-Low-Expansion glass (ULE®) has become an important technological enabler of advanced imaging for astronomy and for extreme-UV lithography. A major limitation though, is that ULE® cannot be poured from the fluid state unlike ZERODUR® which renders costly to produce large and/or complex shapes from it. Beside mirrors, optical components are rarely made of ULE® despite it sharing many properties of pure fused silica glass. Here we explore how femtosecond laser processing combined with laser induced reflow can be used to structure ULE® glass with the goal of producing miniature optical components. To fulfil optical roughness requirements, we adopt a strategy based on first producing elementary shapes, such as cubes or cylinders, that we further topologically transform into sphere, ellipsoids or curved surfaces, using a laser-reflow process. The structural modification of the glass matrix induced by the reflow were investigated using Raman spectroscopy. Our result points to a densification of the glass but no apparent sign of crystallization or devitrification. Furthermore, to understand whether the thermo-mechanical properties were affected or not, the thermal expansion coefficient was estimated using a dilatometry technic based on a pseudo-bimorph micro-cantilevers in a temperature-controlled chamber.



4:30pm - 4:45pm
ID: 377 / TOM5 S03: 4
TOM 5 Optical Materials

Exploration of responsive photonic arrays fabricated by two photon lithography

Jing Qian1, Srikanth Kolagatla2, Iseult Ryan2, Larisa Florea2, Colm Delaney2, A. Louise Bradley1

1School of Physics and AMBER, Trinity College Dublin, College Green, Dublin 2, Ireland; 2School of Chemistry and AMBER, Trinity College Dublin, College Green, Dublin 2, Ireland

Responsive hydrogel photonic structures were fabricated using two-photon lithography. The design versatility of two-photon lithography provides for unprecedented manipulation of transmittance and reflectance spectra, producing distinct structural color. Hydrogel photonic structures have potential for wide range applications, in this instance we demonstrate examples of color transformation, reversible vapor sensing, and pH detection.



4:45pm - 5:00pm
ID: 386 / TOM5 S03: 5
TOM 5 Optical Materials

Probing buried interfaces in SiOxNy thin films via ultrafast acoustics: the role transducing layer thickness

Martina Tauchmanova, Pavel Mokry, Vit Kanclir, Jan Vaclavik, Petra Vesela, Karel Zidek

Institute of Plasma Physics of the Czech Academy of Sciences, Czech Republic

Probing buried interfaces in thin films is a crucial task in many fields, including optical coating. Ultrafast acoustics provide a means to characterize the interfaces by using an acoustic wave localized on the nanometer scale. We provide a brief overview of our thorough study of the interface between SiOxNy thin films and Si substrate by using both single-color and broadband picosecond acoustics. The experiment allows us to track the effect of stoichiometry on the acoustics wave propagation and transition over the layer-substrate interface. To optimize the experiment, we also created simulations to study the effect of optoacoustic layer thickness. We show that the used Ti layer features an optimum thickness between 5-10 nm to reveal details of the interface properties.



 
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