TOM 1 - Silicon Photonics and Guided-Wave Optics
TOM 2 - Computational, Adaptive and Freeform Optics
TOM 3 - Optical System Design, Tolerancing and Manufacturing
TOM 4 - Bio-Medical Optics
TOM 5 - Resonant Nanophotonics
TOM 6 - Optical Materials: crystals, thin films, organic molecules & polymers, syntheses, characterization and applications
TOM 7 - Thermal radiation and energy management
TOM 8 - Non-linear and Quantum Optics
TOM 9 - Opto-electronic Nanotechnologies and Complex Systems
TOM 10 - Frontiers in Optical Metrology
TOM 11 - Tapered optical fibers, from fundamental to applications
TOM 12 - Optofluidics
TOM 13 - Advances and Applications of Optics and Photonics
EU Project Session
Early Stage Researcher Session
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Please note that all times are shown in the time zone of the conference. The current conference time is: 11th Aug 2022, 09:40:29pm WEST
TOM10 S01: Frontiers in Optical Metrology: Scatter techniques
2:30pm - 4:00pm
2:30pm - 3:00pm Invited ID: 265 / TOM10 S01: 1 TOM 10 Frontiers in Optical Metrology
Practical limits and opportunities with speckle metrology
Luleå University of Technology, Sweden
In this presentation, the role of speckles as a carrier of information in phase-based optical metrology is re-visited. Starting with the fundamental mechanisms for speckle decorrelation it is shown that information about the state of an object is transferred through the modified mutual coherence function and can be detected either through the phase, speckle movement, speckle decorrelation or as a combination. The presentation is focusing on practical scale laws that set the limit for what is possible to achieve with present day technology and is demonstrated with a few examples incorporating measurements of microstructural changes, strain, shape, lenses and other refractive index objects.
3:00pm - 3:15pm ID: 111 / TOM10 S01: 2 TOM 10 Frontiers in Optical Metrology
Influence of displacement gradients on laser speckle photography
León Schweickhardt1, Andreas Tausendfreund1, Dirk Stöbener1,2, Andreas Fischer1,2
1University of Bremen, Bremen Institute for Metrology, Automation and Quality Science (BIMAQ), Germany; 2University of Bremen, MAPEX Center for Materials and Processes, Germany
The influence of first and second order displacement gradients on laser speckle photography is investigated in a simulative study that is supported with experimental data. The systematic error is found to scale linearly with the second order gradient, while the random error scales with the first order gradient. The gradient-based error dominates the uncertainty budget of an in-process measurement during single tooth milling close to the machined surface.
3:15pm - 3:30pm ID: 217 / TOM10 S01: 3 TOM 10 Frontiers in Optical Metrology
Coherent Fourier scatterometry for particle detection on structured surfaces
Anubhav Paul, Dmytro Kolenov, Silvania F. Pereira
TU Delft, Netherlands, The
We demonstrate the detection of particles/contamination present on a structured surface using Coherent Fourier scatterometry (CFS) by applying Fourier filtering to the scanned maps, which eliminates background effects due to the electronic noise as well the structure itself. We show that by using filters in the Fourier space we can significantly improve the detection capabilities of the particles present on the structure.
3:30pm - 3:45pm ID: 257 / TOM10 S01: 4 TOM 10 Frontiers in Optical Metrology
Coherent Fourier Scatterometry for defect detection on SiC samples
Jila Rafighdoost, Dmytro Kolenov, Silvania F. Pereira
Delft University of Technology (TU Delft), Netherlands, The
Coherent Fourier Scatterometry (CFS) is a scatterometry technique that has been applied for grating and nanoparticle detection. Here, it has been challenged to verify the detectability of the so-called killer defects on SiC samples for power electronic applications. It has been shown that CFS is able to precisely recognize these defects regardless of their shape or size. CFS could be considered as a possible alternative for this purpose.
3:45pm - 4:00pm ID: 197 / TOM10 S01: 5 TOM 10 Frontiers in Optical Metrology
Characterisation of nanowire structures with scatterometric and ellipsometric measurements
Nanowire structures arranged in a hexagonal lattice are to be characterized in terms of their diameter, height and pitch. A scatterometer and an imaging Mueller matrix ellipsometer, which is a combination of a commercial Mueller matrix ellipsometer and a microscope, have been used as measurement tools. These measurements are supported by numerical simulations using the finite element method to characterize the structure parameters.