TOM 1 - Silicon Photonics and Guided-Wave Optics
TOM 2 - Computational, Adaptive and Freeform Optics
TOM 3 - Optical System Design, Tolerancing and Manufacturing
TOM 4 - Bio-Medical Optics
TOM 5 - Resonant Nanophotonics
TOM 6 - Optical Materials: crystals, thin films, organic molecules & polymers, syntheses, characterization and applications
TOM 7 - Thermal radiation and energy management
TOM 8 - Non-linear and Quantum Optics
TOM 9 - Opto-electronic Nanotechnologies and Complex Systems
TOM 10 - Frontiers in Optical Metrology
TOM 11 - Tapered optical fibers, from fundamental to applications
TOM 12 - Optofluidics
TOM 13 - Advances and Applications of Optics and Photonics
EU Project Session
Early Stage Researcher Session
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TOM10 S03: Frontiers in Optical Metrology: Imaging techniques and resolution
8:30am - 10:00am
Session Chair: Ivano Ruo Berchera, INRIM, Italy
Ground floor, 60 seats
8:30am - 9:00am Invited ID: 341 / TOM10 S03: 1 TOM 10 Frontiers in Optical Metrology
Achieving the ultimate optical resolution
Luis L. Sanchez-Soto1,2, Zdenek Hradil3, Jaroslav Rehacek3, Benjamin Brecht4, Christine Silberhorn4
1Universidad Complutense de Madrid, Spain; 2Max Planck Institute for the Science of Light, Erlangen, Germany; 3Department of Optics, Palacky University, Olomouc, Czech Republic; 4Integrated Quantum Optics Group, Paderborn University, 33098 Paderborn, Germany
The accurate estimation of the separation between two signals is at the core of many modern technologies. We show new quantum-inspired schemes able to estimate that separation at the quantum limit. The method works in the spatial, temporal, and frequency domains. The question of whether the optical coherence brings any metrological advantage to mode projections is discussed.
9:00am - 9:15am ID: 132 / TOM10 S03: 2 TOM 10 Frontiers in Optical Metrology
A virtual microscope for simulation of Nanostructures
Poul-Erik Hansen1, Lauryna Siaudinyte2
1DFM, Denmark; 2VSL, The Netherlands
Light-matter interplay is widely used for analyzing the topology of surfaces on small scales for use in areas such as nanotechnology, nanoelectronics, photonics, and advanced materials. Conventional optical microscope imaging methods are limited in resolution to a value comparable to the wavelength, the so-called Abbe limit, and cannot be used to measure nano-sized structures. Scatterometry is an optical method that can measure structures smaller than the wavelength. However, the relative uncertainties of the structure dimensions measured with scatterometry increase with decreasing structure size, and the industry is therefore looking for replacing simple intensity based scatterometry with a phase-sensitive measurement method such as coherent Mueller ellipsometry. In this work, we present a virtual microscope capable of simulating the coherent Mueller ellipsometry and scatterometry response from one-dimensional and two-dimensional periodic structures. Furthermore, we argue that coherent nonnormalized Mueller ellipsometry gives results with less uncertainties than standard normalized Mueller ellipsometry.
9:15am - 9:30am ID: 178 / TOM10 S03: 3 TOM 10 Frontiers in Optical Metrology
Polarization dependency of the 3D transfer behavior in microsphere enhanced interferometry
Lucie Hüser, Tobias Pahl, Peter Lehmann
University of Kassel, Germany
Enhancing the lateral resolution limit in optical microscopy and interferometry is of great interest in recent research. In order to laterally resolve structures including feature dimensions below the resolution limit, microspheres applied in the optical near-field of the specimen are shown to locally improve the resolution of the imaging system. Experimental and simulated results following this approach obtained by a high NA Linnik interferometer are analyzed in this contribution. For further understanding of the transfer characteristics, measured interference data are compared with FEM (finite element method) based simulations with respect to the polarization dependency of the relevant image information.
9:30am - 9:45am ID: 113 / TOM10 S03: 4 TOM 10 Frontiers in Optical Metrology
Influence of camera temperature on MTF measurements with finite image distance
Markus Schake, Michael Schulz
Line Spread Function (LSF) based Modulation Transfer Function (MTF) measurements with finite image distance are sensitive to displacement errors in axial direction. Axial displacements between the sample and camera detector cause defocusing and thus, a MTF error proportional to the axial gradient of the sample's MTF. This article demonstrates the influence of the camera temperature on the focus position in the MTF reference setup at PTB.