Conference Agenda

Topical Meetings and Sessions:

TOM 1 - Silicon Photonics and Guided-Wave Optics
TOM 2 - Computational, Adaptive and Freeform Optics
TOM 3 - Optical System Design, Tolerancing and Manufacturing
TOM 4 - Bio-Medical Optics
TOM 5 - Resonant Nanophotonics
TOM 6 - Optical Materials: crystals, thin films, organic molecules and polymers, syntheses, characterization and devices
TOM 7 - Thermal radiation and energy management
TOM 8 - Nonlinear and Quantum Optics
TOM 9 - Optics at Nanoscale (ONS)
TOM 10 - Optical Microsystems (OMS)
TOM 11 - Waves in Complex Photonic Media
TOM 12 - Optofluidics
TOM 13 - Ultrafast Optical Technologies and Applications
TOM 14 - Advances and Applications of Optics and Photonics
EU Project Session
Early Stage Researcher Session organised by SIOF
Grand Challenges of Photonics Session

More information on the Topical Meetings

Select a date or location to show only sessions at that day or location. Select a single session for detailed view (with abstracts and downloads when you are logged in as registered attendee). Plenary speeches, tutorials, and Early Researcher session will be updated very soon. Thank you for your patience!

Session Overview
TOM3 S05: Optical System Design, Tolerancing and Manufacturing
Wednesday, 15/Sept/2021:
8:15 - 9:45

Session Chair: Oliver Faehnle, Applied Sciences University ODT in Buchs, Switzerland
Location: Aula 9

1st Floor

8:15 - 8:45
ID: 305 / TOM3 S05: 1
TOM 3 Optical System Design, Tolerancing and Manufacturing

Working towards higher precision freeforms, focusing on total error

Jessica DeGroote Nelson, Matthew Brunelle, Daniel Brooks, Jennifer Coniglio, Joshua Beck, Brittany Cox, Todd Blalock

Optimax Systems, Inc., United States of America

Freeform optics can enhance optical performance by reducing the number of elements, enabling lighter and more efficient systems, and by reducing aberrations. The freeform manufacturing process requires control of both the surface form and the surface location simultaneously. The combination of both surface location and form error (surface irregularity and mid-spatial frequency error) is referred to as total error.

8:45 - 9:15
ID: 317 / TOM3 S05: 2
TOM 3 Optical System Design, Tolerancing and Manufacturing

Pre-heating by defocusation of the CO2-Laser polishing beam: an experimental report from the lab-floor

Jens Bliedtner, Oliver Faehnle, Anne-Marie Schwager, Robin Hassel, Andrea Barz

University of Alpplied Sciences Jena, Germany

The laser beam polishing for glass and plastics is a purely thermal process and melts the ground or lapped structures to a depth of limited extent. This results in a smoothing of the surface, whereby the 1st - 4th order shape deviations can be corrected very well and transparent surfaces are created. The newly developed polishing regime is transferable to other optical glasses with high linear expansion coefficients.

9:15 - 9:30
ID: 254 / TOM3 S05: 3
TOM 3 Optical System Design, Tolerancing and Manufacturing

Curved imaging sensor for enhanced very wide-angle optical systems

Gregoire Hein, Wilfried Jahn, Michael Bailly

SILINA, France

Curved imaging sensors bring a paradigm shift in the design of optical systems, enhancing performance and unlocking new scientific and consumer applications. We leverage SILINA’ sensor curving process to illustrate the benefits in image quality brought by curved imaging sensors for very wide-angle lenses.

9:30 - 9:45
ID: 281 / TOM3 S05: 4
TOM 3 Optical System Design, Tolerancing and Manufacturing

Software for system-level analysis of space optical instruments

Bernhard Michel1, Saroj Mahalik2

1Hembach Photonik GmbH, Germany; 2European Space Agency, ESTEC

The optical software RayJack ONE is a non-sequential ray-tracer currently being developed by Hembach Photonik under an ESA contract. The development goal is to better meet the needs for optical analysis in space industry by offering innovative techniques for stray-light simulation, comprehensive tools for optical analysis and the capability to simulate deformed optical surfaces imported from FEM software. The talk highlights novel simulation techniques, including differential ray-tracing, advanced importance sampling and a new approach to multiple scattering simulations. Methods for representing deformed geometries are discussed and demonstrated.