Conference Agenda

Topical Meetings and Sessions:

TOM 1 - Silicon Photonics and Guided-Wave Optics
TOM 2 - Computational, Adaptive and Freeform Optics
TOM 3 - Optical System Design, Tolerancing and Manufacturing
TOM 4 - Bio-Medical Optics
TOM 5 - Resonant Nanophotonics
TOM 6 - Optical Materials: crystals, thin films, organic molecules and polymers, syntheses, characterization and devices
TOM 7 - Thermal radiation and energy management
TOM 8 - Nonlinear and Quantum Optics
TOM 9 - Optics at Nanoscale (ONS)
TOM 10 - Optical Microsystems (OMS)
TOM 11 - Waves in Complex Photonic Media
TOM 12 - Optofluidics
TOM 13 - Ultrafast Optical Technologies and Applications
TOM 14 - Advances and Applications of Optics and Photonics
EU Project Session
Early Stage Researcher Session organised by SIOF
Grand Challenges of Photonics Session

More information on the Topical Meetings

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Session Overview
TOM3 S03: Optical System Design, Tolerancing and Manufacturing
Tuesday, 14/Sept/2021:
16:15 - 17:45

Session Chair: Daewook Kim, University of Arizona, United States of America
Location: Aula 9

1st Floor

16:15 - 16:45
ID: 448 / TOM3 S03: 1
TOM 3 Optical System Design, Tolerancing and Manufacturing

Automated Monte Carlo starting point search methods for the rapid design of complex zoom lenses

Julie Bentley

Univ. of Rochester, United States of America

Very rarely do designers need to go back to thin lens theory and/or invent new design forms. However, the design of a new zoom lens typically requires a designer to “start from scratch”. As a result, considerable emphasis must be placed on the first-order configuration of the starting point design especially since constraints on packaging parameters (e.g. length, diameter, working distance) can change the first-order solution space significantly. A Monte Carlo search method is introduced for generating thin lens monochromatic designs with valid zoom motions and good aberration correction.

16:45 - 17:00
ID: 169 / TOM3 S03: 2
TOM 3 Optical System Design, Tolerancing and Manufacturing

A new theory of induced second-order axial colour

Holger Münz

Carl Zeiss AG, Corporate Research and Technology, Oberkochen, Germany

Moving away from a per-surface analysis, it has been found that induced second-order axial colour effects in an optical system can be fully described by a single sum over spaces between surfaces. This allows to intuitively unterstand and easily analyse the relevance and relative contribution of induced aberrations to the overall correction of axial colour in a system.

17:00 - 17:15
ID: 370 / TOM3 S03: 3
TOM 3 Optical System Design, Tolerancing and Manufacturing

Design of CMP processes for specialty glasses.

Christian Trum

Applied University of Deggendorf, Germany

This work shows the latest approaches to the design of CMP processes for specialty glasses.

The high sensitivity to the most varied of influences makes processing difficult.

Therefore attention is paid to the various process parameters and their effect on product quality.

17:15 - 17:30
ID: 498 / TOM3 S03: 4
TOM 3 Optical System Design, Tolerancing and Manufacturing

Additive manufacturing of high performance metal optics

Nils Heidler1, Enrico Hilpert1, Patrick Stolarczyk2, Marco Perske3, Andreas Zintl4, Karl-Heinz Wandner5, Soheyla Eshlaghi6

1Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena ,Germany; 2Arges GmbH, Wackersdorf, Germany; 3optiX fab GmbH, Jena, Germany; 4Jena-Optronik GmbH, Jena, Germany; 5Hentschel Harteloxal GmbH + Co. Kg, Schorndorf, Germany; 6Pleiger Laseroptik, Witten, Germany

Additive manufacturing is used to process high performance metal optics. The used material is a aluminium-silicon compound (AlSi40). The required process chain, including diamond turning, coating (NiP) and polishing is validated by three different demonstrators. The applicaton fields cover space, EUV-lithography and laser material processing. Hence, a high optical perfomance as well as other critical specifications have to be realized. The different process steps were validated, realizing optical surfaces with a roughness of below 0.3 nm RMS and a surface form deviation of below 100 nm PV.