TOM 1 - Silicon Photonics and Guided-Wave Optics
TOM 2 - Computational, Adaptive and Freeform Optics
TOM 3 - Optical System Design, Tolerancing and Manufacturing
TOM 4 - Bio-Medical Optics
TOM 5 - Resonant Nanophotonics
TOM 6 - Optical Materials: crystals, thin films, organic molecules and polymers, syntheses, characterization and devices
TOM 7 - Thermal radiation and energy management
TOM 8 - Nonlinear and Quantum Optics
TOM 9 - Optics at Nanoscale (ONS)
TOM 10 - Optical Microsystems (OMS)
TOM 11 - Waves in Complex Photonic Media
TOM 12 - Optofluidics
TOM 13 - Ultrafast Optical Technologies and Applications
TOM 14 - Advances and Applications of Optics and Photonics
EU Project Session
Early Stage Researcher Session organised by SIOF
Grand Challenges of Photonics Session
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TOM3 S01: Optical System Design, Tolerancing and Manufacturing
Time:
Tuesday, 14/Sept/2021:
10:15 - 11:45
Session Chair: Marco Hanft, Carl Zeiss AG, Germany
Location:Aula 9 1st Floor
Presentations
10:15 - 10:45 Invited ID: 215 / TOM3 S01: 1 TOM 3 Optical System Design, Tolerancing and Manufacturing
Designing freeform imaging optics based on machine learning
Tong Yang, Wenchen Chen, Dewen Cheng, Yongtian Wang
Beijing Institute of Technology, China, People's Republic of
We proposed design methods of freeform imaging optics based on machine learning. Using a deep-learning-based framework, good starting points can be outputted immediately from a trained artificial neural network based on design requirements and system specifications. Using a reinforcement-learning-based framework, design results with good imaging performance and corresponding design routes can be found automatically. The design experience can be further acquired using the obtained data directly or through other methods such as clustering-based machine learning. Both frameworks reduce dependence on human effort and advanced design skills.
10:45 - 11:00 ID: 114 / TOM3 S01: 2 TOM 3 Optical System Design, Tolerancing and Manufacturing
High precision refractive index measurement of optical glass at SCHOTT
For refractive index measurement two different measurement setups are common: the v-block refractometer for economic refractive index control up to the fifths digit and the spectral goniometer for high precision index measurement over a broad wavelength range 185 nm to 2325 nm up to the sixth digit. To cope with specific production requirements and a high reliability of the measurements SCHOTT develops its own measurement setups and participates in international round-robin tests on refractive index measurement and in the standardization of refractive index measurement methods for the optical industry.
11:00 - 11:15 ID: 155 / TOM3 S01: 3 TOM 3 Optical System Design, Tolerancing and Manufacturing
Investigations on the surface quality of grinded inner contours using different manufacturing strategies on fused silica
Marcel Binder, Sebastian Henkel, Jens Bliedtner
Ernst-Abbe University of Applied Sciences Jena, Germany
The demands on the complexity and accuracy of brittle-hard components (e.g. fused silica) in the field of optical technologies and manufacturing are constantly increasing, which is accompanied by the need to further analyze and optimize modern CNC manufacturing processes. The publication presents investigations on the grinding of internal contours with high aspect ratios, examining the influence of ultrasonic support and various machining strategies, including (ultra) fine grinding using resin-bonded tools.
11:15 - 11:30 ID: 320 / TOM3 S01: 4 TOM 3 Optical System Design, Tolerancing and Manufacturing
Impact analysis of temperature and humidity effects on polishing
Michael Frederik Benisch1, Johannes Liebl1, Werner Bogner1, Oliver Faehnle2, Edda Raedlein3
Polishing optical glass is a complex process involving mechanical and chemical interactions. One mechanical aspect of polishing is the formation of cracks during processing. Within the framework of investigations, the influence of temperature on the formation of scratches on a glass surface is studied.
Likewise, the influence of air humidity and temperature is taken into account during scratch application. In addition we will report on the impact on polishing performance through increasing the chemical reactivity by increasing the slurry fluid temperature.
