TOM 1 - Silicon Photonics and Guided-Wave Optics
TOM 2 - Computational, Adaptive and Freeform Optics
TOM 3 - Optical System Design, Tolerancing and Manufacturing
TOM 4 - Bio-Medical Optics
TOM 5 - Resonant Nanophotonics
TOM 6 - Optical Materials: crystals, thin films, organic molecules and polymers, syntheses, characterization and devices
TOM 7 - Thermal radiation and energy management
TOM 8 - Nonlinear and Quantum Optics
TOM 9 - Optics at Nanoscale (ONS)
TOM 10 - Optical Microsystems (OMS)
TOM 11 - Waves in Complex Photonic Media
TOM 12 - Optofluidics
TOM 13 - Ultrafast Optical Technologies and Applications
TOM 14 - Advances and Applications of Optics and Photonics
EU Project Session
Early Stage Researcher Session organised by SIOF
Grand Challenges of Photonics Session
Select a date or location to show only sessions at that day or location. Select a single session for detailed view (with abstracts and downloads when you are logged in as registered attendee). Plenary speeches, tutorials, and Early Researcher session will be updated very soon. Thank you for your patience!
Please note that all times are shown in the time zone of the conference. The current conference time is: 29th June 2022, 09:52:01 CEST
TOM13 S04: Ultrafast: High harmonic generation and XUV science 1
16:00 - 17:45
Session Chair: Christoph M. Heyl, DESY & Helmholtz-Institute Jena, Germany
Location:Aula 1 1st floor
16:00 - 16:30 Invited ID: 170 / TOM13 S04: 1 TOM 13 Ultrafast Optical Technologies and Applications
The PST beamline: a laboratory-scale setup for extreme ultraviolet ptychography in the silicon transparency window
Lars Loetgering1,2,3, Wilhelm Eschen1,2, Vittoria Schuster1,2, Robert Klas1,2, Michael Steinert1, Thomas Pertsch1,4, Jens Limpert1,2,4, Jan Rothhardt1,2,4
1Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-Universität Jena, Albert-Einstein-Str. 6, 07745 Jena, Germany; 2Helmholtz-Institute Jena, Fröbelstieg 3, 07743 Jena, Germany; 3Leibniz Institute of Photonic Technology, Albert-Einstein-Str. 9, 07745, Jena, Germany; 4Fraunhofer Institute for Applied Optics and Precision Engineering, Albert-Einstein-Str. 7, 07745 Jena, Germany
Extreme ultraviolet microscopy and wavefront sensing are key challenges in the development of next-generation ultrafast applications. Ptychography offers a single solution to both of the aforementioned challenges. Originally proposed and developed in the electron and synchrotron communities, the increase in flux and stability of high harmonic sources has enabled the transfer of ptychography to the laboratory. Here, we present the status of the PST beamline, a versatile tool for laboratory-scale XUV ptychography in the silicon transparency window, including the latest experimental results demonstrating sub-30nm lateral resolution at 13.5 nm wavelength.
16:30 - 16:45 ID: 294 / TOM13 S04: 2 TOM 13 Ultrafast Optical Technologies and Applications
Microwatt-class intra-oscillator high harmonic generation in argon, krypton, and xenon
Julian Fischer, Jakub Drs, Francois Labaye, Norbert Modsching, Valentin J. Wittwer, Thomas Südmeyer
Time and Frequency Laboratory (LTF), Switzerland
We present an intra-oscillator high harmonic generation source based on a 100-fs Kerr lens mode-locked Yb:YAG thin-disk laser. We generate XUV light with an average power of 10 µW at 30 eV in argon, 12 µW at 25 eV in krypton, and 30 µW at 20 eV in xenon.
16:45 - 17:00 ID: 285 / TOM13 S04: 3 TOM 13 Ultrafast Optical Technologies and Applications
Continuously tunable high photon flux high harmonic source at 50 – 70 eV
Alexander Kirsche1,2, Robert Klas1,2, Martin Gebhardt1,2, Lucas Eisenbach1, Wilhelm Eschen1, Joachim Buldt1, Henning Stark1, Jan Rothhardt1,2,3, Jens Limpert1,2,3
1Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-University Jena, Albert-Einstein-Str. 15, 07745 Jena, Germany; 2Helmholtz-Institute Jena, Fröbelstieg 3, 07743 Jena, Germany; 3Fraunhofer Institute for Applied Optics and Precision Engineering, Albert-Einstein-Str. 7, 07745 Jena, Germany
In this contribution a fully tunable high harmonic source is presented, which delivers a photon flux of over 1x10^11 photons/s per harmonic line in the range of 50 eV to 70 eV. This table-top waveguide-based XUV source is driven by a 50 W, 1.0 mJ, 36 fs nonlinearly post-compressed fiber laser centered at 1030 nm with a repetition rate of 50 kHz. The tunability of the XUV spectrum is achieved by exploiting the intensity-dependent blueshift of the driving laser field in a noble gas within the waveguide.
17:00 - 17:15 ID: 427 / TOM13 S04: 4 TOM 13 Ultrafast Optical Technologies and Applications
Sub-light-cycle control of relativistic plasma-mirrors
Marie Ouillé1,2, Jaismeen Kaur1,2, Stefan Haessler1, Zhao Cheng1, Aline Vernier1, Jérôme Faure1, Rodrigo Lopez-Martens1
We report on carrier-enveloppe phase (CEP) effects on the emission of high-order harmonics and electron beams from plasma mirrors driven by relativistic-intensity near-single-cycle laser pulses at 1 kHz repetition rate.
17:15 - 17:45 Invited ID: 441 / TOM13 S04: 5 TOM 13 Ultrafast Optical Technologies and Applications
Laser wakefield accelerators as a broadband radiation source
University of Alberta, Canada
A Laser Wakefield Accelerator (LWFA) can accelerate electrons up to many GeV energies using the accelerating field structure in the wake of a high-power laser pulse propagating through low-density plasma. Within the accelerating structure, energetic electrons can undergo betatron oscillations, emitting a bright, broadband source of keV X-rays with femtosecond-scale duration. A LWFA can also drive wavelength-tunable pulses of infrared radiation with high focusability through spectral broadening of the laser pulse within plasma waves. In this talk, I will discuss the generation and application of these diverse radiation sources.